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ISB35832 Datasheet PDF : 15 Pages
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active power distribution. Since the power distribu-
tion serves as the well ties the inherent capacitance
of the reversed biased well junctions is closely
coupled into the power distribution and functions as
localized decoupling capacitance helping to keep
high frequency noise from being coupled from one
macro to the other through the power distribution.
The salicided active local distribution of the DOU-
BLE BUFFER cell is supplied its power by a screen
grid of power bused on both second and third metal.
The second metal buses run every nine cells and
are two wiring tracks wide. Vss and Vdd is inter-
leaved every other bus. The third level buses run
every thirty six tracks and are three tracks wide. This
grid is sufficient to power all but the largest arrays
though the use of custom structured cores or gate
counts above 500,000 usable cells along with high
clock rates may result in the need for supplemental
power. The overall die power distribution is broken
down into a minimum of three Vdd and three Vss
distributions. Optionally other distributions for spe-
cialized I/O may be inserted. The standard distribu-
tions are Internal Vdd and Vss, serving the internal
cells and the prebuffer sections of the I/O, External
Vdd and Vss serving the output transistors only, and
Receiver Vdd and Vss serving the first stages of the
receiver cells. Optional distributions for 5.0V inter-
face, GTL, CTL, and other standards can be utilized
as necessary.
The following section details the elements which
make up the ISB35000 Series library. The elements
are organised into three categories:
1. Macrocell library with Input, Output, Bidirectional
Buffers including JTAG macrocells and Core
2. Macrofunctions
3. Module generators
4. Embedded Functions
ISB35000 technology does not utilize a standard
type I/O cell but is a leader in the emerging Sea of
I/O approach to handling the chip interface problem.
This approach starts at the bond pad area of the I/O
where the pad size and pitch is not determined until
the customers choice of packaging, signal interface
standards and I/O count is considered. Wire bond
pad spacings for 80 micron centres are available
where large signal counts are most important.
Pad spacing can be increased incrementally. It is
expected that most designs will use 100 or 120
micron spacings. It is also possible to use different
spacings for different width output sections when
needed within the same device.
Along with the variable bond pad spacing the I/O
output transistor section does not have a fixed
width. Previous technologies utilized a design ap-
proach where the desired full function buffer was
designed for a maximum current taking one pad
location with the usual current in the range of twenty
four milliamps. The approach followed in ISB35000
is to have identical twenty micron wide output tran-
sistor slices stepped around the die. Each slice
contains one set of protection diodes to the external
power rails and eight P and eight N transistors. The
transistors are specifically laid out and selectively
non salicided for ESD protection and latch up pre-
vention. These slices are paralleled to meet the
current needs of the user, for example, to construct
a 24mA sink and 12mA source LVTTL buffer, a
number of slices would be used. The next group of
devices that makes up the I/O circuits is again a 20
u wide slice of specialized transistors that are util-
ized to form the slew rate control sections of the I/O.
Each of these slices has circuits to control the
switching of up two sections of P and N output
transistors. These sections are of course created
from the output transistor slice above the slew rate
section and can be connected as desired by the
designer. Many configurations of circuits can be
created to supply the desired results with slew rate
slices paralleled with multiple output sections. A
further function of the scan circuits is current spike
suppression during switching of the I/O transistors.
The logic utilized causes the conducting transistors
to turn off before the opposing set of transistors turn
Inside the slew rate sections the next slices of
specialized designed components step on a 40
micron wide pattern. The first of these 40 micron
wide sections is utilized for predriver circuits; these
include specialized built in test functions for the I/O.
The predriver of course interfaces the core signals
controlling tristate and switching functions with the
slew rate and output transistor sections but it also
allows all Output Buffers to be driven high, low or
put into tristate regardless of the state of the internal
logic greatly simplifying parametric testing of the
part and also assisting customers who wish to use
this feature during board testing. Note that all output
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